王江涌

王江涌的个人简介

王江涌，汕头大学物理系教授。

人物经历

学历简介：学士1984 武汉大学物理系理论物理专业硕士1989 四川大学原子与分子物理研究所原子与分子物理专业博士1997 南非University of the Free State 物理系表面物理专业

工作经历：

1984年7月 至 1986年8月 武汉科技大学物理系 助教 1989年7月 至 1994年2月 武汉科技大学物理系 讲师 1998年1月 至 1998年9月 南非 University of the Free State 物理系 博士后 (Research Associate) 1998年10月 至 2001年2月 美国 Kansas State University 物理系 博士后 (Research Associate) 2001-3 至 2009-4 德国 Max Planck Institute for Metals Research 资深研究员(Senior Scientist) 2009年5月 至 现在 汕头大学物理系 教授?

担任课程

本科生:?普通物理，复变函数，数理方程，理论力学

研究生:?材料物理研究方法，材料科学基础，表面与界面的偏析

科研方向

薄膜中的扩散、偏析、相变及表征

承担项目

[?1?]?国家自然科学基金项目?薄膜中界面相变机制的研究；2013/1/1―2016/12/31；[?2?]?国家部委其它科技项目?利用高分辨深度剖析方法确定纳米结构中的互扩散系数；2011/6/21―2013/8/31；[?3?]?广东省科技计划项目?新型触控显示器件功能薄膜材料体系的设计与应用?2017.?1-2019.12；[?4?]?科技部国际合作交流项目?用先进的物理手段来改进生物医学材料的性能?2014-2016；[?5?]?国家自然科学基金项目?中国-以色列NSFC-ISF合作交流项目?纳米尺度下扩散机制的研究：纳米颗粒及纳米层结构中的扩散?2015-2018；[?6?]?科技部国际合作交流项目?超薄层深度剖析的定量分析?2016.12-2018.11；

研究成果

[?1?]?Representative?papers:?(*?为通讯作者?corresponding?author)；[?2?]?Bruce?M.?Law*,?Sean?P.?McBride,?Jiang?Yong?Wang,?Haeng?Sub?Wi,?Govind?Paneru,?Santigo?Betelu,?Baku?Ushijima,?Youichi?Takata,?Bret?Flanders,?Fernando?Bresme,?Hiroki?Matsubara,?Takanori?Takiue,?Makoto?Aratono；Line?tension?and?its?influence?on?droplets?and?particles?at?surfaces；Progress?in?Surface?Science，92（2017）1-39.；[?3?]?H.L.Kang,?J.B.?Lao,?Z.P.?Li,?W.Q.?Yao*,?C.?Liu,?J.Y.?Wang*；Reconstruction?of?GaAs/AlAs?supperlattice?multilayer?structure?by?quantification?of?AES?and?SIMS?sputter?depth?profiles；Applied?Surface?Science,?388?(2016)?584-588.；[?4?]?S.?Hofmann,?Y.?Liu,?W.?Jian,?H.L.?Kang,?J.Y.?Wang*；Depth?resolution?in?sputter?profiling?revisited；Surface?and?Interface?Analysis,?48（2016）1354-1369.；[?5?]?康红利,?简玮,?韩逸山,?刘毅,?王江涌*；溅射深度剖析定量分析及其应用研究进展；汕头大学学报（自然科学版）,?Vol.?31,?No.?2,?PP.?3-24,?2016?（特邀综述）；[?6?]?JY?Wang*,?ZM?Wang,?LPH?Jeurgens?and?EJ?Mittemeijer；Diffusion,?Crystallization,?and?Layer?Exchange?upon?Low-Temperature?Annealing?of?Amorphous?Si/Polycrystalline?Al-Layered?Structures；Chapter?3?(pp.?61-101),?Ed:?ZM?Wang,?LPH?Jeurgens?and?EJ?Mittemeijer,?Pan?Stanford?Publishing?Pte.?Ltd.,?USA,?2015.；[?7?]?B.?Lin,?W.?Jian?and?J.Y.?Wang；Understanding?of?phase?transformation?in?Pd/a-Si?bilayered?system；Journal?of?Alloys?and?Compounds,?665?(2016)?42-47.；[?8?]?Lin?Huang,?Wei?Jian,?Bing?Lin,?Yuren?Wen,?Lin?Gu?and?Jiangyong?Wang*；Thermodynamic?understanding?of?Sn?whisker?growth?on?the?Cu?surface?in?Cu(top)-Sn(bottom)?bilayer?system?upon?room?temperature?aging；Journal?of?Applied?Physics,?117?(2015)?215308；[?9?]?XinLiang?Yan,?Yi?Liu,?Hendrik?Swart,?JiangYong?Wang?and?Koos?Terblans；Investigation?of?interdiffusion?and?depth?resolution?in?Cu/Ni?multilayer?by?means?of?AES?depth?profiling；Applied?Surface?Science,?364?(2016)?567u2013572.；[?10?]?Y.?Liu,?S.?Hofmann,?J.?Y.?Wang*,?B.?R.?Chakraborty；Quantitative?reconstruction?of?Ta/Si?multilayer?depth?profiles?obtained?by?ToF-?SIMS?using?Cs+?ion?sputtering；Thin?Solid?Films,?591?(2015)?60-65；[?11?]?Y.?Liu,?W.?Jian,?J.Y.?Wang*,?S.?Hofmann,?K.?Shimizu；Quantitative?reconstruction?of?the?GDOES?sputter?depth?profile?of?a?monomolecular?layer?structure?of?thiourea?on?copper；Applied?Surface?Science?331?(2015)?140u2013149；[?12?]?Y.?Liu,?S.?Hofmann,?J.Y.?Wang*；An?Analytical?Depth?Resolution?Function?for?the?MRI?Model；Surface?and?Interface?Analysis?(Rapid?Communication)，45(2013)?1659-1660；[?13?]?Min?Lin,?Xu?Chen,?Xinyi?Li,?Chi?Huang,?Yanxiu?Li,?Jiangyong?Wang*；Local?equilibrium?in?the?dissolution?and?segregation?kinetics?of?Ag?on?Cu(111)?surface；Applied?Surface?Science,?297?(2014)?130-133；[?14?]?Y.?Liu,?W.H.?Yu,?J.?Y.?Wang*；A?model?for?quantification?of?GDOES?depth?profiles；Vacuum,?113?(2015)?5-10；[?15?]?陈德锋，廖桂颖，王江涌；基于遗传算法的最速降线问题求解；力学研究(International?Journal?of?Mechanics?Research)，4?(2015)?76-88.；[?16?]?[?17?]?表面与界面的偏析?（Surface?and?Interface?segregation)；[?18?]?陈煜，黄立豪，杨士栋，邹永恒，姜国利，王江涌*；钯-硅(Pd-Si)薄膜表面偏析研究；材料科学研究,?6?(2016)?334-345.；[?19?]?Guoli?Jiang,?Jiangyong?Wang；Methods?for?Stress?Measurement；Material?Sciences?(Chinese)?6?(2016)?11-25.；[?20?]?李艳秀，林F，蒋苏华，冼志科，邹永恒，王江涌*；表面偏析浓度非连续变化现象的定量解释；真空，51,?（2014）?74-78；[?21?]?X.L.?Yan,?M.?Lin,?J.Y.?Wang；Equilibrium?and?kinetic?surface?segregations?in?Cuu2013Sn?thin?films；Applied?Physics?A,?113?(2013)?423-430；[?22?]?Xinyi?Li,?Min?Li,?Xu?Chen,?Chi?Huang,?Yanxiu?Li,?Jiangyong?Wang*；Influence?of?bulk?concentration?on?the?discontinuous?transition?in?surface?segregation；Advanced?Materials?Research?648?(2013)?pp?35-42.；[?23?]?X.L.?Yan,?J.Y.?Wang*；Size?effects?on?surface?segregation?in?Ni-Cu?alloy?thin?flms；Thin?Solid?Films?529?(2013),?pp.?483-487；[?24?]?Min?Lin,?Xu?Chen,?Xinyi?Li,?Chi?Huang,?Yanxiu?Li,?Jiangyong?Wang*；Local?equilibrium?in?the?dissolution?kinetics?of?Ag?on?Cu(111)?surface；Advanced?Materials?Research?648?(2013)?pp?43-49.；[?25?]?颜心良，王江涌*；二元合金薄膜的表面偏析；真空?49,?No.4,?PP.?63-67,?Jul.?2012.；[?26?]?JY?Wang,?J?du?Plessis*,?JJ?Terblans?and?GN?van?Wyk；The?equilibrium?surface?segregation?of?silver?to?the?low?index?surfaces?of?a?copper?single?crystal；Surface?&?Interface?Analysis?28?(1999)?73；[?27?]?JY?Wang*；Equilibrium?and?kinetic?surface?segregation?in?binary?alloy?thin?films；Applied?Surface?Science,?252?(2006)?5347；[?28?]?JY?Wang,?J?du?Plessis*,?JJ?Terblans?and?GN?van?Wyk；Kinetics?near?the?discontinuous?surface?transition?in?the?Cu(111)(Ag)?binary?segregating?system；Surface?Science,?423?(1999)?12；[?29?]?JY?Wang,?J?du?Plessis*,?JJ?Terblans?and?GN?van?Wyk；The?Discontinuous?surface?transition?in?the?Cu(111)(Ag)?binary?segregating?system；Surface?Science,?419?(1999)?197.；[?30?]?EC?Viljoen,?JY?Wang,?WJ?Erasmus,?JJ?Terblans?and?J?du?Plessis*；Ordered?monolayer?overstructures?formed?on?Cu?surfaces?through?segregation；Materials?Science?Forum,?294?(1999)?457；[?31?]?薄膜材料深度剖析的定量分析?(Quantitative?sputter?depth?profiling?in?thin?films)；[?32?]?李炯，林炜轩，程鹤登，陈榕杰，王江涌*；非高斯高度分布函数构造的表面形貌的表征；表面技术，45?(2016)?205-212.；[?33?]?林炜轩，王江涌*；高度分布函数与自相关函数对表面粗糙度参数的影响；表面技术，46?(2017)?241-249.；[?34?]?康红利，劳珏斌，刘毅，王江涌*；SIMS溅射深度剖析的定量分析；真空,?52,?No.1,?PP.?1-6,?2015.；[?35?]?Yi?Liu,?Weixuan?Lin,?Weibing?Ye,?Huansheng?Li,?Jiong?Li,?Weihua?Yu,?and?Jiangyong?Wang*；Determination?of?the?interface?roughness?between?Ni-coated?layer?and?Cu?substrate?by?glow?discharge?optical?emission?spectroscopy?depth?profiling；Advanced?Materials?Research,?1094?(2015)?181-187；[?36?]?S.?Hofmann,?Y.?Liu,?J.?Y.?Wang,?J.?Kovac；Comparison?of?Analytical?and?Numerical?Resolution?Functions?in?Sputter?Depth?Profiling；Applied?Surface?Science,?314(2014)?942-955；[?37?]?马春华，刘毅，黄云驰，程鹤登，韩逸山，朱星星，叶伟斌，王江涌*；规则表面形貌的表征；汕头大学学报（自然科学版）29?（2014）35-42.；[?38?]?Y.?Liu,?W.?Jian,?J.Y.?Wang,?S.?Hofmann,?J.?Kovac；Influence?of?non-Gaussian?roughness?on?sputter?depth?profiles；Applied?Surface?Science.?276?(2013)?447-453；[?39?]?W.?Jian,?Y.?Liu,?X.Y.?Wang,?S.P.?Rao,?S.?Hofmann,?J.Y.?Wang；Quantification?of?AES?depth?profiling?data?of?polycrystalline?Al?films?with?Gaussian?and?non-Gaussian?surface?height?distribution；Surface?and?Interface?Analysis,?45?(2013)?1148-1151；[?40?]?Xiaoyin?Wang,?Wei?Jian,?Yi?Liu,?Shaoping?Rao,?Xingxing?Zhu,?Yishan?Han,?Jiangyong?Wang*；Determination?of?coated?substrate?roughness?by?quantification?of?measured?depth?profiles；Advanced?Materials?Research,?602-604?(2013)?pp?1624-1629.；[?41?]?Shaoping?Rao,?Yi?Liu,?Xiaoyin?Wang,?Wei?Jian,?Jiangyong?Wang*；Quantification?of?N2+?implanted?AES?depth?profiling?data?in?Al；Advanced?Materials?Research，602-604?(2013)?pp?1808-1813.；[?42?]?刘毅，王江涌*；择优溅射对深度剖析谱和深度分辨率的影响；真空?49,?No.2,?PP.?71-76,?Mar.?2013.；[?43?]?Y.?Liu,?J.Y.?Wang,?S.?Hofmann?and?J.?Kovac；Quantification?of?the?N2+?implanted?AES?depth?profiles?in?Cobalt；Advanced?Materials?Research,?557-559?(2012)?pp.?1653-1640.；[?44?]?J.Y.?Wang,?Y.?Liu,?S.?Hofmann?and?J.?Kovac；Influence?of?nonstationary?atomic?mixing?on?depth?resolution?in?sputter?depth?profiling；Surface?and?Interface?Analysis.?2012,?44,?PP.?569-572；[?45?]?刘毅，王江涌；溅射深度剖析的定量分析及其应用；真空?49,?No.2,?PP.?71-76,?Mar.?2012.；[?46?]?JY?Wang；Determination?of?Interdiffusion?Coefficient?in?Nanolayered?Structures?by?Auger?Electron?Spectroscopical?SputterDepth?Profiling；Advanced?Materials?Research，306-307?(2011)?pp?1354-1359.；[?47?]?JY?Wang*,?U?Starke?and?EJ?Mittemeijer；Evaluation?of?the?depth?resolutions?of?AES,?XPS,?TOF-SIMS?sputter?depth?profiling?techniques；Thin?Solid?Films,?517?(2009)?3402；[?48?]?S.?Hofmann?and?JY?Wang*?and?A?Zalar；Backscattering?effect?in?quantitative?AES?sputter?depth?profiling?of?multilayers；Surface?and?Interface?Analysis,?39?(2007)?787；[?49?]?S.?Hofmann*?and?JY?Wang；Implementing?the?electron?backscattering?factor?in?quantitative?sputter?depth?profiling?using?AES；Surface?and?Interface?Analysis,?39?(2007)?324；[?50?]?S.?Hofmann*?and?JY?Wang；AES?depth?profiling?with?a?titled?sample?in?front?of?a?cylindrical?mirror?analyzer:?quantification?and?profile?shape?changes?according?to?an?extension?of?the?conventional?MRI?model；Surface?and?Interface?Analysis,?39?(2007)?45；[?51?]?S.?Hofmann*?and?JY?Wang；The?MRI-Model?in?sputter?depth?profiling:?capabilities,?limitations?and?recent?progress；Journal?of?Surface?Analysis,?13?(2006)?142；[?52?]?JY?Wang*,?A?Zalar,?and?EJ?Mittemeijer；Depth?dependences?of?the?ion?bombardment?induced?roughness?and?of?the?interdiffusion?coefficient?for?Si/Al?multilayers；Applied?Surface?Science,?222?(2004)?171；[?53?]?JY?Wang*?and?EJ?Mittemeijer；A?new?method?for?the?determination?of?the?diffusion-induced?concentration?profile?and?the?interdiffusion?coefficient?for?thin?solid?film?systems?by?Auger?electron?spectroscopical?sputter?depth?profiling；Journal?of?Materials?Research,?19?(2004)?681；[?54?]?JY?Wang*,?S.?Hofmann,?A?Zalar?and?EJ?Mittemeijer；Quantitative?evaluation?of?sputtering?induced?surface?roughness?in?depth?profiling?of?polycrystalline?multilayers?using?Auger?electron?spectroscopy；Thin?Solid?Films,?444?(2003)?120；[?55?]?JY?Wang*,?A?Zalar,?YH?Zhao?and?EJ?Mittemeijer；Determination?of?the?interdiffusion?coefficient?for?Si/Al?multilayers?by?Auger?electron?spectroscopical?sputter?depth?profiling；Thin?Solid?Films,?433?(2003)?92；[?56?]?S.?Hofmann*?and?JY?Wang；Progress?in?quantitative?sputter?depth?profiling?using?the?MRI-model；Journal?of?Surface?Analysis,?10?(2003)?52；[?57?]?T?Wagner*,?JY?Wang,?and?S?Hofmann；Sputter?Depth?Profiling?in?AES?and?XPS,?Chapter?22,?in?Surface?Analysis?by?Auger?and?X-ray?Photoelectron；Ed:?D.?Briggs?and?J.?Grant,?IM?Publications,?West?Sussex,?UK?and?SurfaceSpectra?Limited,?Manchester,?UK,?2003,?p.619；[?58?]?S.?Hofmann*?and?JY?Wang；Determination?of?the?depth?scale?in?sputter?depth?profiling；Journal?of?Surface?Analysis,?9?(2002)?336；[?59?]?薄膜中的扩散及相变?(Diffusion?and?phase?transformation?in?thin?films)；[?60?]?林冰，戴钟保，高梦滢，王江涌*；薄膜中的扩散及应力模型；材料科学研究,?6?(2016)?413-431.；[?61?]?蒋金春，简?玮，毛?婷，林文伟，邹永恒，罗以琳，王江涌*；可形成硅化物的金属诱导非晶硅晶化机制的研究；材料保护，48,?PP.?139-144,?2015；[?62?]?林?冰，黄?琳，简?玮，王江涌*；界面热力学在锡晶须生长研究中的应用；表面技术，44?(2015)?1-8；[?63?]?简?玮，林?冰，黄?琳，王江涌*；薄膜材料中的界面热力学；材料科学研究，2(2013)?58-68；[?64?]?Lin?Huang,?Xuenian?Lin,?Renwu?Chen?and?Jiangyong?Wang*；Sn?whisker?growth?in?Cu?(top)-Sn?(bottom)?bilayer?system?upon?room?temperature?aging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